High Density Plasma Sources: Design, Physics and Performance by Oleg A. Popov

By Oleg A. Popov

This ebook describes the layout, physics, and function of excessive density plasma assets that have been commonly explored in low strain plasma processing, corresponding to plasma etching and planarization, plasma improved chemical vapor deposition of skinny motion pictures, sputtered deposition of metals and dielectrics, epitaxial development of silicon and GaAs, and lots of different purposes. it is a accomplished survey and an in depth description of so much complex excessive density plasma resources utilized in plasma processing. The publication is a balanced presentation in that it supplies either a theoretical remedy and sensible functions. it may be of substantial curiosity to scientists and engineers engaged on plasma resource layout, and procedure improvement.

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High Density Plasma Sources: Design, Physics and Performance

This publication describes the layout, physics, and function of excessive density plasma resources that have been widely explored in low strain plasma processing, equivalent to plasma etching and planarization, plasma stronger chemical vapor deposition of skinny motion pictures, sputtered deposition of metals and dielectrics, epitaxial progress of silicon and GaAs, and plenty of different purposes.

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8 I i \ ~ _.... /. 2 l : ~ ! ~. j. _+_ : r. ! •. S r (em) Figure 28. Measurements of the normalized magnitudes of B r , B{;, and B z for R-wave excitation (Fig. 12 MHzJ66] The theoretical curves for the m = + 1 (solid) and m =- 1 (dashed) modes were computed from the measured density profiles. l ........ ~ ~ B ~ : ~ . . . . . ~. ~L~......... 1. 1, ; ; . J . 1 ! l ' ! ! : : :. ~:. : : : : :~: i - . 8 ...... ~,... \ B ~ ~ ~ • "\ • i i i• !. / 1...... ;. : . 5 . J:I:).. i ~ :...... 5 Z .

Sincejz oc B z in the lowest approximation, the energy absorption should vary radially as Bl oc Jj(Tr). These profiles are shown in Sec. 3. However, the measured density profiles do not always agree with this absorption rate. Antennas and Polarization. [88]), shown schenlatically in Fig. 9. The important elements of the antenna are the two legs carrying current along the nlagnetic field. A rising current in the directions shown would induce an opposing electric field in the plasnla \vhich would cause space charges to build up as shown.

12 MHz. The curves refer to different values of RF power and different antennas, B for Boswell-type, and N for Nagoya Type m. Direct measurements of the axial wavenumber k are difficult in Type A devices, since an internal probe shaft movable in the axial direction tends to interfere with the discharge. However, measurements are possible with external detectors or with axial probes in Type B or Type C devices. ,[61] in a Type B device, used a longitudinally movable magnetic probe to measure the phase and amplitude of the helicon wave after it leaves the antenna region.

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